平面顯示器用鋁合金靶材鍍膜特性之研究

Characteristic of Sputtering Thin Film of Al Alloy Target for Liquid Crystal Display

10.6409/JMSE.200406.0079

陳家驊(C. H. Chen)；黃信二(H. E. Huang)；王漢能(H. N. Wang)；李訓杰(S. J. Lee)；葉建宏(C. H. Yeh)

鋁鈧合金、鋁釹合金、靶材、濺鍍薄膜、反射率 ； Al-Sc alloy ； Al-Nd alloy ； Target ； Sputtering thin film ； Reflection

材料科學與工程

36卷2期（2004 / 06 / 01）

79 - 85

繁體中文

本研究主要針對鋁釹(Al-Nd)及鋁鈧(Al-Sc)合金靶材，利用濺鍍方式製成薄膜後，針對平面顯示器應用特性進行研究，並進行顯微組織觀察及薄膜物理特性量測，實驗中顯示在熱處理前後，鋁鈧合金薄膜之粗糙度(Ra)比鋁釹合金薄膜之粗糙度小，相對地突起物(Hillock)也較少，預期造成元件短路失效的機率較低。在熱處理前鋁鈧合金薄膜的電阻值較鋁釹合金薄膜低，經過熱處理後，兩合金薄膜之電阻值皆有效的降低，其中鋁釹合金薄膜之電阻值降幅比鋁鈧合金薄膜大。在反射率量測方面，熱處理前鋁鈧合金薄膜反射率較的鋁釹合金稍差，但熱處理後，兩者的反射率皆有所提升。實驗顯示鋁鈧合金能滿足平面顯示器中驅動電路導線材料之應用需求。

The purpose of this research is mainly focusing on the characteristics study of the sputtering Al alloy thin film. The film, made by the spotted coating method, is laid the interconnections of TFT-LCDs. The film properties are observed by micro-structural analysis and membrane physic property measurement. Experiment shows that, after the heat treatment, the roughness of the Al-Sc alloy membrane is less than that of the Al-Nd alloy, and the hillock is comparatively less. Therefore, the component failure rate is predicated less. The resistivity of the Al-Sc thin film is less than the Al-Nd thin film before heat treatment and both resistivity values are effectively reduced after heat treatment, even though the reduced range of resistivity for Al-Nd is larger than the value of Al-Sc alloy membrane. As for the reflectance differences, the measured value of Al-Sc alloy is less than the value of Al-Nd before heat treatment; both reflectance values are effectively improved after heat treatment. Experiment shows Al-Sc alloy is more appropriate used as the driving circuit lead wire material of TFT-LCDs.