| 题名 |
Evolution of Vacancy Supersaturation in Relation to Electromigration in Thin Film Metallization |
| 作者 |
黃暉理(Huei-Li Huang)；趙一雄(Yi-Shung Chaug) |
| 关键词 | |
| 期刊名称 |
Chinese Journal of Physics |
| 卷期/出版年月 |
12卷2期（1974 / 10 / 01） |
| 页次 |
61 - 68 |
| 内容语文 |
英文 |
| 英文摘要 |
Theory of evolution of vacancy supersaturation in grain boundary in relation to electromigration based on the concept of the critical length for void growth is presented. The theory offers satisfactory explanation to some peculiar phenomena hitherto unexplained. |
| 主题分类 |
基礎與應用科學 >
物理 |
