题名 |
Phonon-Plasmon Interaction in GaN Films Studied by Raman Scattering |
作者 |
C. C. Shen;C. K. Shu;H. C. Lin;W. K. Chen;W. H. Chen;M. C. Lee |
关键词 | |
期刊名称 |
Chinese Journal of Physics |
卷期/出版年月 |
36卷1期(1998 / 02 / 01) |
页次 |
27 - 31 |
内容语文 |
英文 |
英文摘要 |
GaN films of different buffer thicknesses (from 0 to 600 Å) were grown on (0001) sapphire using MOCVD. The epitaxial films show autodoping with carrier concentration ranging from 8x 10^16 to 5x 10^17 cm^-3 as determined by Hall measurements. The Raman scattering reveals that the A1(LO) mode shifts from 733 to 740 cm^-1 as a result of the phonon-plasmon interaction. |
主题分类 |
基礎與應用科學 >
物理 |
被引用次数 |