题名 |
A New Method of Growing YBa2Cu3Oy, 45" Bi-epitaxial Thin Films on MgO Substrate |
作者 |
S. H. Tsai;J. R. Chiou;C. C. Chi;M. K. Wu |
关键词 | |
期刊名称 |
Chinese Journal of Physics |
卷期/出版年月 |
36卷2S期(1998 / 04 / 01) |
页次 |
355 - 359 |
内容语文 |
英文 |
英文摘要 |
We have developed a new bi-epitaxial structure, namely YBCO/CeO2/YSZ/PrBCO /MgO and YBCO/CeO2/YSZ/MgO b oundary to replace the original YBCO/CeO2/ YSZ/MgO and YBCO/MgO boundary. The new structure has several advantages. One is for the device fabrication consideration because the non-superconducting PrBCO thin films with brown color can be used as an endpoint detection for dry etching. The second one is to reduce the mismatch between YBCO and MgO substrate. The third benefit is to get rid of a small amounts of 45'' orientation in YBCO/MgO, which might cause the junction to be shorted. X-ray Ø scans are performed to charactenze the epitaxial grouth and crystalline axis rotations. Critial currents of 2 mm wide junctions are measured. |
主题分类 |
基礎與應用科學 >
物理 |