Chemisorption of Methyl (CH3) and Methylnitrene (NCH3) Radicals on Cu Surfaces Studied by STM and LEED

Woei Wu Pai；Yuet Loy Chan；Tung J. Chuang

Chinese Journal of Physics

43卷1S期（2005 / 02 / 01）

212 - 218

英文

We report direct STM observation of the formation of two-dimensional islands of methyl radical (CH3) on Cu(111) and Cu(110) surfaces, and methylnitrene radical (NCH3) islands on Cu(110). In corroboration with LEED measurements, plausible adsorption models of each system are proposed. In all studied cases, first-order reaction kinetics of long-chain alkene production from methyl or azomethane (CH3N2CH3) production from methylnitrene can be correlated with the adsorbate islanding behavior.