多功能式極紫外光微影元件檢測服務平台

Multi-functional Extreme Ultraviolet Lithography Component Inspection Platform

卓文浩(Wen-Hao Cho)；吳品鈞(Pin-Jiun Wu)；李建霖(Chien-Lin Lee)；黃羿誌(I-Chih Huang)；李昭德(Chao-Te Lee)；蔡坤諭(Kuen-Yu Tsai)；李佳翰(Jia-Han Li)

科儀新知

240期（2024 / 09 / 30）

45 - 56

繁體中文;英文

先進半導體製程已由193 nm ArF光源邁入13.5 nm極紫外光（EUV）時代，伴隨而來的是光學系統、光罩材料、光阻等全面革新。為因應此一技術轉型，本團隊建置了「多功能式極紫外光微影元件檢測服務平台」，提供光罩、光阻、反射鏡等關鍵元件的檢測服務。藉由極紫外光檢測技術之開發，以協助國內半導體產業克服EUV製程中材料與製程挑戰，加速先進製程技術開發。

Advanced semiconductor manufacturing has transitioned from the 193 nm ArF light source to the 13.5 nm extreme ultraviolet (EUV) era, which has been accompanied by comprehensive changes in optical systems, mask materials, photoresists. In response to this technological transformation, our team has established an extreme ultraviolet lithography component inspection platform to provide inspection services for key components such as masks, resists, and mirrors. Through the development of extreme ultraviolet inspection technologies, we aim to assist the domestic semiconductor industry in overcoming material and process challenges in EUV manufacturing, accelerating the development of advanced process technologies.