EUV計量標準與量測系統不確定度

EUV Metrology and Measurement Uncertainties

莊宜蓁(Yi-Chen Chuang)；陳政憲(Cheng-Hsien Chen)

科儀新知

240期（2024 / 09 / 30）

57 - 67

繁體中文;英文

為配合國內半導體先進微影技術發展，國家度量衡標準實驗室（National Measurement Laboratory, NML）啟動發展極紫外（EUV）波段光輻射量測與校正技術，首先進行的是EUV光偵測器分光響應（spectral responsivity）校正系統與技術之建立，已與國家同步輻射中心（National Synchrotron Radiation Research Center, NSRRC）合作，建置相關硬體設備與量測系統，並執行相關量測系統評估與校正流程之測試。本文將以EUV光偵測器分光響應校正為例，介紹其系統架構、量測原理、系統追溯圖、及量測不確定度，希望透過此計量標準的建立，協助晶圓廠更精確地掌握曝光參數、精簡製程程序、進而達成節能之效。

To support the development of advanced EUV lithography for the semiconductor industry in Taiwan, an EUV calibration system for photodiodes' spectral responsivity was established by the National Measurement Laboratory (NML). This EUV spectral responsivity calibration system is the first radiometric calibration system in the EUV region in Taiwan. This system utilizes the EUV radiation generated from synchrotron radiation light source provided by the National Synchrotron Radiation Research Center (NSRRC). Some calibration procedures have been tested and compared. And strategies to reduce measurement uncertainties were also studied. In this article, the EUV spectral calibration system will be introduced, including the calibration principles, metrological traceability, and uncertainty evaluation details. Through the establishment of metrology standard, local foundries could tune the exposure parameters of an EUV exposure machine with more certain knowledge, and thus could simplify the dose calibration processes and save energy consumption.