超解析度系綜繞射顯微術之簡介與發展應用

Introduction to Ensemble Diffraction Microscopy Under Super-resolution

陳寧容(Ning-Jung Chen)；陳健群(Chien-Chun Chen)

科儀新知

240期（2024 / 09 / 30）

92 - 103

繁體中文;英文

同調光繞射顯微術是一種不需要晶體的情況下，以同調光為光源，並以原子解析度成像微材料的顯微成像技術。然而由於缺乏高角度散射訊號，其空間解析度往往被限制在幾奈米。為了突破空間解析度的極限，我們提出了系綜繞射顯微術。該技術不僅提高了成像解析度，在光源的種類上也不再僅受限於同調光，並且對於樣品種類也有極高的相容性。本文將從頭介紹系綜繞射顯微術的理論推導並搭配不同光源以證明該技術的可行性，接著展示系綜繞射顯微術個別成功成像無機和有機奈米粒子。最後在結論的部分將總結此技術在材料結構學上的淺力。

Coherent diffraction microscopy (CDM) is a microscopy imaging technique that utilize coherent light sources to image micromaterials at atomic resolution without the need for crystals. However, due to the lack of high-angle scattering signals, the spatial resolution is often limited to several nanometers. To overcome the limitations of spatial resolution, we propose ensemble diffraction microscopy (EDM). This technique not only enhances imaging resolution but also accommodates various light sources and diverse samples. This article introduces the theoretical derivation of EDM from the beginning and demonstrate the feasibility of this technique using different light sources. Subsequently, it will showcase the successful imaging of both inorganic and organic nanoparticles using coherent diffraction microscopy. Finally, the conclusion will summarize the potential of this technique in materials crystallography.