题名

Optomechanical Design of Collimated UV Source Module

DOI

10.6567/IFToMM.14TH.WC.PS20.005

作者

C.-H. Lee;C. C. Cheng;C. H. Liao

关键词

lithography ; UV ; PCB ; uniformity ; collimation

期刊名称

Proceedings of the 14th IFToMM World Congress

卷期/出版年月

14th-5(2015 / 11 / 06)

页次

573 - 576

内容语文

英文

英文摘要

This paper presents a UV (ultraviolet) lithography apparatus that utilizes an array composed of UV-LED (light emitting diode) collimation modules as a micro-patterning light source for PCB (printed circuit board) fabrication. To provide a uniform (non-uniformity > 90%) and collimated (FWHM < ±2°) exposure area, hexagonal light source modules are disposed in a hexagonal array. Each module is consisted of a LED chip, a biconvex lens to enhance UV collimation and uniformity, and a hexagonal sidewall to absorb the side propagation UV light. The whole exposure system is thus composed a layer of heat sink (made of a copper cooling plate), a plurality of UV-LEDs disposed in an array, a baffle wall extending between UV-LED and the respective plurality of collimating lenses.

主题分类 工程學 > 機械工程