题名 |
Optomechanical Design of Collimated UV Source Module |
DOI |
10.6567/IFToMM.14TH.WC.PS20.005 |
作者 |
C.-H. Lee;C. C. Cheng;C. H. Liao |
关键词 |
lithography ; UV ; PCB ; uniformity ; collimation |
期刊名称 |
Proceedings of the 14th IFToMM World Congress |
卷期/出版年月 |
14th-5(2015 / 11 / 06) |
页次 |
573 - 576 |
内容语文 |
英文 |
英文摘要 |
This paper presents a UV (ultraviolet) lithography apparatus that utilizes an array composed of UV-LED (light emitting diode) collimation modules as a micro-patterning light source for PCB (printed circuit board) fabrication. To provide a uniform (non-uniformity > 90%) and collimated (FWHM < ±2°) exposure area, hexagonal light source modules are disposed in a hexagonal array. Each module is consisted of a LED chip, a biconvex lens to enhance UV collimation and uniformity, and a hexagonal sidewall to absorb the side propagation UV light. The whole exposure system is thus composed a layer of heat sink (made of a copper cooling plate), a plurality of UV-LEDs disposed in an array, a baffle wall extending between UV-LED and the respective plurality of collimating lenses. |
主题分类 |
工程學 >
機械工程 |