DOI
是数位物件识别码
(
D
igital
O
bject
I
dentifier
)
的简称,
为物件在网路上的唯一识别码,可用于永久连结并引用目标物件。
使用DOI作为永久连结
每个DOI号前面加上
「
http://dx.doi.org/
」
便成为永久网址。
如以DOI号为
10.5297/ser.1201.002
的文献为例,此文献的永久连结便是:
http://dx.doi.org/
10.5297/ser.1201.002
。
日后不论出版单位如何更动此文献位置,永久连结所指向的位置皆会即时更新,不再错失重要的研究。
引用含有DOI的文献
有DOI的文献在引用时皆应同时引用DOI。若使用APA、Chicago以外未规范DOI的引用格式,可引用DOI永久连结。
DOI可强化引用精确性、增强学术圈连结,并给予使用者跨平台的良好使用经验,目前在全世界已有超过五千万个对象申请DOI。 如想对DOI的使用与概念有进一步了解,请参考 ( ) 。
杨舒涵 , 硕士 导师:陈厚光
繁体中文
氧化锌 ; 图案化制程 ; 水热法 ; 侧向磊晶成长 ; 晶体缺陷 ; ZnO ; lateral epitaxial overgrowth ; hydrothermal growth ; crystal defects ; patterning process
- [1] G. Yuan, Z. Ye, L. Zhu, J. Huang, Q. Qian, and B. Zhao, "Gold schottky contacts on n-type ZnO thin films with an Al/Si(100) substrates," Journal of Crystal Growth, vol. 268, pp.169-173, 2004.
连结: - [2] Y. B. Zhang, S. Li, and G. K. L. Goh, "Lateral epitaxial overgrowth of ZnO films on a seed layer buffered MgAl2O4 substrate in water," in Third International Conference on Smart Materials and Nanotechnology in Engineering. vol. 8409, J. Leng, Y. BarCohen, I. Lee, and J. Lu, Eds., ed, 2012.
连结: - [3] W. C. T. Lee, P. Miller, E. D. Walsby, A. Markwitz, J. Kennedy, R. J. Reeves, et al., "Characterisation of ZnO thin films grown directly on sapphire by PAMBE," presented at the 2004 Conference on Optoelectronic and Microelectronic Materials and Devices, Bribane, QLD; Australia, 2005.
连结: - [4] Y. K. Sun, D. Cherns, R. P. Doherty, J. L. Warren, and P. J. Heard, "Reduction of threading dislocations in ZnO/(0001) sapphire film heterostructure by epitaxial lateral overgrowth of nanorods," Journal of Applied Physics, vol. 104, p.023533, Jul 15 2008.
连结: - [5] H. L. Zhou, H. Pan, T. K. Chan, C. S. Ho, Y. P. Feng, S. J. Chua, et al., "Channeling contrast microscopy of epitaxial lateral overgrowth of ZnO/GaN films," Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, vol. 260, pp 299-303, Jul 2007.
连结: