题名 |
Characteristics of p-type GaN Films Doped with Isoelectronic Indium Atoms |
作者 |
F. C. Chang;K. C. Shen;H. M. Chung;M. C. Lee;W. H. Chen;W. K. Chen |
关键词 | |
期刊名称 |
Chinese Journal of Physics |
卷期/出版年月 |
40卷6期(2002 / 12 / 01) |
页次 |
637 - 643 |
内容语文 |
英文 |
英文摘要 |
The method of isoelectronic doping, is employed to prepare p-type GaN films using metalorganic chemical vapor deposition. With the addition of In atoms, the film surface becomes much smoother, and the corresponding hole concentration and resistivity are also improved, to 8.7 £ 10^17 cm^(-3) and » 1 Ω-cm, respectively. More interestingly, it is found that an ohmic I-V characteristic can be obtained in such types of films without any dehydrogenation treatment. |
主题分类 |
基礎與應用科學 >
物理 |
被引用次数 |
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